Microstructure and resolution of etched patterns of Photoresist (AZP4620) layers spin-coated under artificially elevated gravity accelerations by two-axis spin coating technology
Crossref DOI link: https://doi.org/10.1007/s10854-023-09981-9
Published Online: 2023-02-14
Published Print: 2023-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Mahmoodi, Soroosh http://orcid.org/0000-0003-4643-0244
Text and Data Mining valid from 2023-02-01
Version of Record valid from 2023-02-01
Article History
Received: 4 August 2022
Accepted: 25 January 2023
First Online: 14 February 2023
Declarations
:
: There is no conflict of interest.