Fabrication and characterisation of memristor device using sputtered hafnium oxide
Crossref DOI link: https://doi.org/10.1007/s10854-023-10613-5
Published Online: 2023-05-22
Published Print: 2023-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Sharon, Antony https://orcid.org/0000-0002-7437-8802
Subin, P. S.
Jayaraj, M. K.
Antony, Aldrin
Text and Data Mining valid from 2023-05-01
Version of Record valid from 2023-05-01
Article History
Received: 24 February 2023
Accepted: 9 May 2023
First Online: 22 May 2023
Declarations
:
: The authors declare that they have no conflict of interest.