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Optimization of structural, electrical, and magnetic properties of the solution-processed IZO MOSFET adopting spin coating technique and its performance

Crossref DOI link: https://doi.org/10.1007/s10854-024-13331-8

Published Online: 2024-08-12

Published Print: 2024-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Lephe, S.

Raj, S. M. Gifrin Fredik

Janaki, S.

Jamina, C.

Das, S. Jerome

Dhas, S. Sahaya Jude

Jose, L. Arun https://orcid.org/0000-0002-1398-2686
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Text and Data Mining valid from 2024-08-01

Version of Record valid from 2024-08-01
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Article History

Received: 23 May 2024

Accepted: 3 August 2024

First Online: 12 August 2024

Declarations

:

: The authors declare that they have no known competing financial interests or personal relationships that could have appeared to influence the work reported in this paper.

: The research article is in compliance with Ethical Standards<b>.</b>

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