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Texturing of silicon nitride passivation layers on functional behaviour study of polycrystalline silicon (p-Si) made with plasma enhanced chemical vapour deposition

Crossref DOI link: https://doi.org/10.1007/s10854-024-14135-6

Published Online: 2024-12-31

Published Print: 2025-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Rathinavelu, Venkatesh https://orcid.org/0009-0004-2975-7450
Upadhyay, Viyat Varun

Prabagaran, S.

Govindarajan, S.

Verma, Apurv

Soudagar, Manzoore Elahi M.

Vinayagam, Mohanavel

Alotaibi, Majed A.

Seikh, Asiful H.
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Article History

Received: 30 August 2024

Accepted: 18 December 2024

First Online: 31 December 2024

Declarations

:

: The authors have no relevant financial or non-financial interests to disclose.

: This is an observational study. Texturing of silicon nitride passivation layers on functional behaviour study of polycrystalline silicon (p-Si) made with plasma enhanced chemical vapor deposition: The Research Ethics Committee has confirmed that no ethical approval is required.

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