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Formation and properties of nickel silicides in the Ni/Mo/Ni/Si(100) thin-film system

Crossref DOI link: https://doi.org/10.1007/s10854-025-14386-x

Published Online: 2025-02-12

Published Print: 2025-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Messai, Imad https://orcid.org/0000-0002-0875-8356
Bounab, El-oualid
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Text and Data Mining valid from 2025-02-01

Version of Record valid from 2025-02-01
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Article History

Received: 23 May 2024

Accepted: 3 February 2025

First Online: 12 February 2025

Declarations

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: All authors declare that they have no conflicts of interest.