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Effect of argon and oxygen atmospheres on the growth and characteristics of NiO thin films deposited by RF sputtering technique

Crossref DOI link: https://doi.org/10.1007/s10854-026-17343-4

Published Online: 2026-04-26

Published Print: 2026-04

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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