Ultralow-dielectric, nanoporous poly(methyl silsesquioxanes) films templated by a self-assembled block copolymer upon solvent annealing
Crossref DOI link: https://doi.org/10.1007/s10965-018-1650-z
Published Online: 2018-12-06
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wang, C.
Wang, T. M.
Wang, Q. H.
Funding for this research was provided by:
the Nature Science Foundation of China (51403219)
Text and Data Mining valid from 2018-12-06
Article History
Received: 24 April 2018
Accepted: 6 November 2018
First Online: 6 December 2018