Low energy Xe ion beam engineering in optical, structural and morphological properties of hafnium oxide thin films grown by atomic layer deposition technique
Crossref DOI link: https://doi.org/10.1007/s10967-024-09747-5
Published Online: 2024-09-13
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kumar, Rajesh
Gupta, Deepika
Bansal, Muskaan
Jyoti, Naveen
Deepika,
Kumar, Ashok
Text and Data Mining valid from 2024-09-13
Version of Record valid from 2024-09-13
Article History
Received: 1 April 2024
Accepted: 30 August 2024
First Online: 13 September 2024