Thickness-dependent phase evolution and dielectric property of Hf0.5Zr0.5O2 thin films prepared with aqueous precursor
Crossref DOI link: https://doi.org/10.1007/s10971-015-3871-5
Published Online: 2015-10-01
Published Print: 2016-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yan, Yong
Zhou, Dayu
Guo, Chunxia
Xu, Jin
Yang, Xirui
Liang, Hailong
Zhou, Fangyang
Chu, Shichao
Liu, Xiaoying
Funding for this research was provided by:
National Natural Science Foundation of China (CN) (NSFC 51272034)
Text and Data Mining valid from 2015-10-01