Microstructure, ferroelectric and dielectric properties in Nd and Ti co-doped BiFeO3 thin film
Crossref DOI link: https://doi.org/10.1007/s10971-016-3977-4
Published Online: 2016-02-16
Published Print: 2016-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lv, P. P.
Yang, C. H.
Geng, F. J.
Feng, C.
Jiang, X. M.
Hu, G. D.
Funding for this research was provided by:
National Natural Science Foundation of China (51002064, 51372100)
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