Fabrication of heterostructure NiO/ZnO thin film for pseudocapacitor application
Crossref DOI link: https://doi.org/10.1007/s10971-022-05919-5
Published Online: 2022-08-13
Published Print: 2022-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Vijaya Prasath, G.
Usha, K. S.
Karuppaiah, M.
Ravi, G.
Krishnan, P.
Text and Data Mining valid from 2022-08-13
Version of Record valid from 2022-08-13
Article History
Received: 14 February 2022
Accepted: 25 July 2022
First Online: 13 August 2022
Compliance with ethical standards
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: The authors declare no competing interests.