Fabrication of a porous SiO2 thin film with an ultralow refractive index for anti-reflective coatings
Crossref DOI link: https://doi.org/10.1007/s10971-023-06108-8
Published Online: 2023-04-22
Published Print: 2023-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Suzuki, Ryoko http://orcid.org/0000-0002-4101-2118
Text and Data Mining valid from 2023-04-22
Version of Record valid from 2023-04-22
Article History
Received: 31 January 2023
Accepted: 1 April 2023
First Online: 22 April 2023
Compliance with ethical standards
:
: The author declares no competing interests.