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Factors controlling the performance of film patterns of cured sol-gel-derived positive-type photosensitive oligomeric silsesquioxanes with random structure

Crossref DOI link: https://doi.org/10.1007/s10971-024-06428-3

Published Online: 2024-06-04

Published Print: 2024-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Suwa, Mitsuhito

Tanino, Takahiro

Fujii, Manami

Kamogawa, Masao

Kozuka, Hiromitsu
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Text and Data Mining valid from 2024-06-04

Version of Record valid from 2024-06-04
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Article History

Received: 23 February 2024

Accepted: 19 May 2024

First Online: 4 June 2024

Compliance with ethical standards

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: The authors declare no competing interests.

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