Thermal properties of some organosilicon precursors for chemical vapor deposition
Crossref DOI link: https://doi.org/10.1007/s10973-016-5563-y
Published Online: 2016-06-14
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ermakova, E. N.
Sysoev, S. V.
Nikolaev, R. E.
Nikulina, L. D.
Lis, A. V.
Tsyrendorzhieva, I. P.
Rakhlin, V. I.
Plyusnin, P. E.
Kosinova, M. L.
Funding for this research was provided by:
Russian Foundation for Basic Research (13-03-01198)
License valid from 2016-06-14