Preparation of Silicon Thin Films of Different Phase Composition from Monochlorosilane as a Precursor by RF Capacitive Plasma Discharge
Crossref DOI link: https://doi.org/10.1007/s11090-016-9703-8
Published Online: 2016-03-24
Published Print: 2016-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Mochalov, L. A.
Kornev, R. A.
Nezhdanov, A. V.
Mashin, A. I.
Lobanov, A. S.
Kostrov, A. V.
Vorotyntsev, V. M.
Vorotyntsev, A. V.
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