Plasma-Chemical Treatment of Process Gases with Low-Concentration Fluorine-Containing Components
Crossref DOI link: https://doi.org/10.1007/s11090-016-9755-9
Published Online: 2016-11-01
Published Print: 2017-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Park, H. S.
Vaschenko, S. P.
Kartaev, E. V.
Batomunkuev, D. Yu.
License valid from 2016-11-01