Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH4 + Ion and Related Reverse Ion–Molecule Reactions of Interest to PECVD of a-Si:H Films
Crossref DOI link: https://doi.org/10.1007/s11090-017-9825-7
Published Online: 2017-06-03
Published Print: 2017-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Nguyen, T. N.
Lee, Y. M.
Wu, J. S.
Lin, M. C.
License valid from 2017-06-03