Loop Type of Inductively Coupled Thermal Plasmas System for Rapid Two-Dimensional Oxidation of Si Substrate Surface
Crossref DOI link: https://doi.org/10.1007/s11090-018-9881-7
Published Online: 2018-02-22
Published Print: 2018-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Tsuchiya, Takumi
Tanaka, Yasunori
Maruyama, Y.
Fujita, A.
Tial, M. K. S.
Uesugi, Y.
Ishijima, T.
Yukimoto, T.
Kawaura, H.
Text and Data Mining valid from 2018-02-22
Article History
Received: 29 November 2017
Accepted: 12 February 2018
First Online: 22 February 2018