Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries
Crossref DOI link: https://doi.org/10.1007/s11090-018-9933-z
Published Online: 2018-10-05
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Byung Jun
Efremov, Alexander
Lee, Junmyung
Kwon, Kwang-Ho
Text and Data Mining valid from 2018-10-05
Article History
Received: 8 May 2018
Accepted: 28 September 2018
First Online: 5 October 2018