Peculiarities of Si and SiO2 Etching Kinetics in HBr + Cl2 + O2 Inductively Coupled Plasma
Crossref DOI link: https://doi.org/10.1007/s11090-018-9943-x
Published Online: 2018-11-10
Published Print: 2019-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Byung Jun
Efremov, Alexander
Kim, Jihun
Kim, Changmok
Kwon, Kwang-Ho
Text and Data Mining valid from 2018-11-10
Article History
Received: 7 March 2018
Accepted: 1 November 2018
First Online: 10 November 2018