Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion–Molecule Reactions of Interest to PECVD of α-Si:H Films
Crossref DOI link: https://doi.org/10.1007/s11090-019-10012-x
Published Online: 2019-07-24
Published Print: 2019-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Nguyen, T. N.
Lee, Y. M.
Wu, J. S.
Lin, M. C.
Text and Data Mining valid from 2019-07-24
Version of Record valid from 2019-07-24
Article History
Received: 28 March 2019
Accepted: 9 July 2019
First Online: 24 July 2019