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The Effect of the Process Parameters on the Composition and Properties of Silica-Like Films Deposited by Atmospheric Pressure PECVD in the System TEOS-He-O2

Crossref DOI link: https://doi.org/10.1007/s11090-022-10287-7

Published Online: 2022-09-23

Published Print: 2022-11

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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