Document is current
Any future updates will be listed below
-
Authors
Kim, Ju Sung
Choi, Jinsung
Hong, Young June
Choi, Eun Ha
- License Information
-
More Information
Article History
Received: 26 February 2023
Accepted: 15 May 2023
First Online: 9 June 2023
Declarations
:
: Here we declare that there is no any conflicts of interests in our manuscript among authors, which will be submitted to <i>Plasma Chemistry and Plasma Processing,</i> titled “Sn Etching of Extreme Ultraviolet (EUV) Mirror Surface Using Ar–H<sub>2</sub> Atmospheric Pressure Arc Plasma Jet.”
: This manuscript has not been published before, and it is not under consideration for publication in another journal. Also this manuscript is free from plagiarism less than 10%.
