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Multi-cycle Chamber Conditioning for Plasma Etching of SiO2: From Optimization to Stability in Lot Processing

Published Online: 2024-07-08

Published Print: 2024-09

Authors

Nawaz, Ali

Cian, Alessandro

Ferrario, Lorenza

Picciotto, Antonino
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Text and Data Mining valid from 2024-07-08

Version of Record valid from 2024-07-08
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Article History

Received: 15 February 2024

Accepted: 30 June 2024

First Online: 8 July 2024

Declarations

:

: The authors declare no competing interests.

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