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Formation of Porous Silicon Oxides for Single-Layer Anti-reflection Coatings on Transparent Materials Using Atmospheric-Pressure Very High-Frequency Plasma

Crossref DOI link: https://doi.org/10.1007/s11090-025-10559-y

Published Online: 2025-03-28

Published Print: 2025-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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