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Formation of Heterostructured Silicon Thick Films in Atmospheric-Pressure Very High-Frequency Plasma for Possible Application to Lithium Ion Battery Anode

Crossref DOI link: https://doi.org/10.1007/s11090-025-10573-0

Published Online: 2025-05-29

Published Print: 2025-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Hamzens, Afif https://orcid.org/0000-0002-9911-204X
Mochizuki, Shota

Naufal, Farrel Dzaudan https://orcid.org/0000-0002-1733-8521
Hiromoto, Koki

Ohmi, Hiromasa https://orcid.org/0000-0001-6827-6052
Kakiuchi, Hiroaki https://orcid.org/0000-0003-4504-7219
Funding

Funding for this research was provided by:

Ministry of Education, Culture, Sports, Science, and Technology, Japan
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Article History

Received: 30 January 2025

Accepted: 10 May 2025

First Online: 29 May 2025

Declarations

:

: The authors declare no competing interests.

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