Thermodynamic modeling of the deposition of Si—C—N films from the gas phase during the decomposition of organosilicon compounds
Crossref DOI link: https://doi.org/10.1007/s11172-018-2167-7
Published Online: 2018-09-27
Published Print: 2018-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shestakov, V. A.
Ermakova, Е. N.
Sysoev, S. V.
Kosyakov, V. I.
Kosinova, M. L.
Text and Data Mining valid from 2018-06-01
Article History
Received: 23 October 2017
Accepted: 15 March 2018
First Online: 27 September 2018