Chemical vapor deposition of boron-containing films using B(OAlk)3 as precursors: thermodynamic modeling
Crossref DOI link: https://doi.org/10.1007/s11172-019-2656-3
Published Online: 2019-12-12
Published Print: 2019-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Shestakov, V. A.
Kosyakov, V. I.
Kosinova, M. L.
Text and Data Mining valid from 2019-11-01
Version of Record valid from 2019-11-01
Article History
Received: 29 January 2019
Revised: 30 July 2019
Accepted: 22 August 2019
First Online: 12 December 2019