Plasma Etching in InAlN/GaN Hemt Technology
Crossref DOI link: https://doi.org/10.1007/s11182-020-02006-6
Published Online: 2020-05-25
Published Print: 2020-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Filippov, I. A.
Shakhnov, V. A.
Velikovskii, L. E.
Brudnyi, P. A.
Demchenko, O. I.
Text and Data Mining valid from 2020-05-01
Version of Record valid from 2020-05-01
Article History
Received: 14 October 2019
First Online: 25 May 2020