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Electrical Response of Al Based Zr-Doped Stacked Tri-Layer HfO2 Deposited at Various Substrate Temperature

Crossref DOI link: https://doi.org/10.1007/s11182-024-03198-x

Published Online: 2024-07-02

Published Print: 2024-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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