SegNet-OPC: A Mask Optimization Framework in VLSI Design Flow Based on Semantic Segmentation Network
Crossref DOI link: https://doi.org/10.1007/s11390-023-3002-7
Published Online: 2025-05-06
Published Print: 2025-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Xu, Hui
Qi, Pan
Tang, Fu-Xin
Liang, Hua-Guo
Huang, Zheng-Feng
Text and Data Mining valid from 2025-03-01
Version of Record valid from 2025-03-01
Article History
Received: 9 January 2023
Accepted: 16 November 2023
First Online: 6 May 2025
Ethics
: Conflict of Interest The authors declare that they have no conflict of interest.