High χ polystyrene-b-polycarbonate for next generation lithography
Crossref DOI link: https://doi.org/10.1007/s11426-017-9043-7
Published Online: 2017-04-27
Published Print: 2017-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wan, Lei
License valid from 2017-04-27