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Spatially-separated and photo-enhanced semiconductor corrosion processes for high-efficient and contamination-free electrochemical nanoimprint lithography

Crossref DOI link: https://doi.org/10.1007/s11426-021-1194-3

Published Online: 2022-03-15

Published Print: 2022-04

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Xu, Hantao

Han, Lianhuan

Su, Jian-Jia

Tian, Zhong-Qun

Zhan, Dongping
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Text and Data Mining valid from 2022-03-15

Version of Record valid from 2022-03-15
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Article History

Received: 18 November 2021

Accepted: 10 January 2022

First Online: 15 March 2022

Ethics

: <b>Conflict of interest</b> The authors declare no conflict of interest.

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