Nanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L10-FePt nanoparticles
Crossref DOI link: https://doi.org/10.1007/s11426-024-2333-x
Published Online: 2025-01-06
Published Print: 2025-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhang, Jie
Chen, Yi
Li, Guijun
Sun, Zelin
Meng, Zhengong
Wong, Wai-Yeung
Text and Data Mining valid from 2025-01-06
Version of Record valid from 2025-01-06
Article History
Received: 24 August 2024
Accepted: 25 September 2024
First Online: 6 January 2025
Ethics
: Conflict of interest The authors declare no conflict of interest.