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Enhancing performance of Ti-Zn-oxo clusters for advanced lithography: effect of vertical ionization potential on sensitivity

Published Online: 2025-04-28

Published Print: 2025-10

Authors

Wang, Daohan

Gong, Xiaofeng

Xu, Runfeng

Zhang, Min

Zhou, Danhong

Fan, Jiangli

Du, Jianjun

Zhao, Jun

Zhang, Jianhua

Chen, Pengzhong

Peng, Xiaojun
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Text and Data Mining valid from 2025-04-28

Version of Record valid from 2025-04-28
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Article History

Received: 5 February 2025

Accepted: 10 March 2025

First Online: 28 April 2025

Ethics

: Conflict of interest The authors declare no conflict of interest.

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