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Formation mechanism of multi-functional black silicon based on optimized deep reactive ion etching technique with SF6/C4F8

Crossref DOI link: https://doi.org/10.1007/s11431-014-5753-4

Published Online: 2015-01-06

Published Print: 2015-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Zhu, FuYun

Zhang, XiaoSheng

Zhang, HaiXia
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Text and Data Mining valid from 2015-01-06