Flatness maintenance and roughness reduction of silicon mirror in chemical mechanical polishing process
Crossref DOI link: https://doi.org/10.1007/s11431-018-9414-6
Published Online: 2019-04-02
Published Print: 2020-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jiang, BoCheng
Zhao, DeWen
Wang, BingQuan
Zhao, HuiJia
Liu, YuHong
Lu, XinChun
Text and Data Mining valid from 2019-04-02
Article History
Received: 31 October 2018
Accepted: 14 December 2018
First Online: 2 April 2019