Monolayer MoS2-based transistors with low contact resistance by inserting ultrathin Al2O3 interfacial layer
Crossref DOI link: https://doi.org/10.1007/s11431-022-2330-3
Published Online: 2023-04-24
Published Print: 2023-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chen, Gang
Lin, Xin
Liu, Yuan
Wang, Fang
Hu, Kai
Shan, Xin
Wu, ZeYu
Zhang, YuPeng
Nie, WeiCan
Zhong, JiXiang
Ren, TianLing
Zhang, KaiLiang
Text and Data Mining valid from 2023-04-24
Version of Record valid from 2023-04-24
Article History
Received: 8 November 2022
Accepted: 30 January 2023
First Online: 24 April 2023