Chemical vapor deposition synthesis of two-dimensional freestanding transition metal oxychloride for electronic applications
Crossref DOI link: https://doi.org/10.1007/s11432-019-2653-9
Published Online: 2019-11-12
Published Print: 2019-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yan, Shengnan
Wang, Pengfei
Wang, Chen-Yu
Xu, Tao
Li, Zhuan
Cao, Tianjun
Chen, Moyu
Pan, Chen
Cheng, Bin
Sun, Litao
Liang, Shi-Jun
Miao, Feng
Text and Data Mining valid from 2019-11-12
Version of Record valid from 2019-11-12
Article History
Received: 17 August 2019
Accepted: 16 September 2019
First Online: 12 November 2019