High power density X-band source-connected field plate-free AlGaN/GaN HEMT with recessed gate oxidation process
Crossref DOI link: https://doi.org/10.1007/s11432-025-4494-2
Published Online: 2026-01-15
Published Print: 2026-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lu, Hao
Ma, Xiaohua
Deng, Longge
Yang, Ling
Hou, Bin
Zhang, Meng
Wu, Mei
Hao, Yue
Text and Data Mining valid from 2026-01-15
Version of Record valid from 2026-01-15
Article History
Received: 11 February 2025
Revised: 21 April 2025
Accepted: 11 June 2025
First Online: 15 January 2026