A new material removal rate model for high-shear and low-pressure grinding of single-crystal silicon considering elastohydrodynamic pressure
Crossref DOI link: https://doi.org/10.1007/s11465-025-0839-1
Published Online: 2025-06-20
Published Print: 2025-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhao, Shuangchen
Tian, Yebing
Liu, Shuang
Wang, Pengzhan
Text and Data Mining valid from 2025-06-01
Version of Record valid from 2025-06-01
Article History
Received: 21 November 2024
Accepted: 18 February 2025
First Online: 20 June 2025
Ethics
: Conflict of Interest The authors declare no conflict of interest.