Demagnification Imaging Improved by Mask in a Hyperlens Photolithography System
Crossref DOI link: https://doi.org/10.1007/s11468-016-0320-4
Published Online: 2016-07-18
Published Print: 2017-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Li, Biao
Hu, Bin
Yang, Yuliang
Wang, Zi
Liu, Juan
Wang, Yongtian
License valid from 2016-07-18