Microstructure and supercapacitive properties of rf-sputtered copper oxide thin films: influence of O2/Ar ratio
Crossref DOI link: https://doi.org/10.1007/s11581-015-1403-5
Published Online: 2015-03-15
Published Print: 2015-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Purusottam-Reddy, B.
Sivajee-Ganesh, K.
Jayanth-Babu, K.
Hussain, O. M.
Julien, C. M.
Text and Data Mining valid from 2015-03-15