Development of In2O3-doped WO3 thick film sensors for CH4 monitoring applications
Crossref DOI link: https://doi.org/10.1007/s11581-026-07166-y
Published Online: 2026-05-09
Published Print: 2026-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Suryawanshi, H. K.
Yenorkar, S. M.
Warale, K. N.
Mane, V. A.
Text and Data Mining valid from 2026-05-09
Version of Record valid from 2026-05-09
Article History
Received: 8 February 2026
Revised: 22 April 2026
Accepted: 3 May 2026
First Online: 9 May 2026
Declarations
:
: The authors declare no competing interests.