Effects of annealing temperature on the properties of copper films prepared by magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s11595-015-1106-9
Published Online: 2015-01-31
Published Print: 2015-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Liu, Yiming
Zhang, Jianjun
Zhang, Wanggang
Liang, Wei
Yu, Bin
Xue, Jinbo
Text and Data Mining valid from 2015-01-31