Document is current

Any future updates will be listed below

Application of Bis[2-(3,4-epoxycyclohexyl)ethyl] octamethyltetrasiloxane in the Preparation of a Photosensitive Resin for Stereolithography 3D Printing

Crossref DOI link: https://doi.org/10.1007/s11595-019-2215-7

Published Online: 2020-04-16

Published Print: 2019-12

Update policy: https://doi.org/10.1007/springer_crossmark_policy

About CrossMark