In Situ Electron Diffraction and Resistivity Characterization of Solid State Reaction Process in Cu/Al Bilayer Thin Films
Crossref DOI link: https://doi.org/10.1007/s11661-019-05602-5
Published Online: 2020-01-06
Published Print: 2020-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Moiseenko, Evgeny T.
Altunin, Roman R.
Zharkov, Sergey M.
Text and Data Mining valid from 2020-01-06
Version of Record valid from 2020-01-06
Article History
Received: 20 July 2019
First Online: 6 January 2020