Factors Leading to the Formation of a Resistive Thin Film at the Bottom of Aluminum Electrolysis Cells
Crossref DOI link: https://doi.org/10.1007/s11663-015-0567-8
Published Online: 2016-01-06
Published Print: 2016-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Coulombe, Marc-André
Soucy, Gervais
Rivoaland, Loig
Davies, Lynne
Text and Data Mining valid from 2016-01-06
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Article History
First Online: 6 January 2016