Impact of Ni Concentration on the Performance of Ni Silicide/HfO2/TiN Resistive RAM (RRAM) Cells
Crossref DOI link: https://doi.org/10.1007/s11664-014-3309-9
Published Online: 2014-07-29
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chen, Z.X.
Fang, Z.
Wang, Y.
Yang, Y.
Kamath, A.
Wang, X.P.
Singh, N.
Lo, G.-Q.
Kwong, D.-L.
Wu, Y.H.
Text and Data Mining valid from 2014-07-29