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Defect Reduction in AlN Epilayers Grown by MOCVD via Intermediate-Temperature Interlayers

Crossref DOI link: https://doi.org/10.1007/s11664-014-3462-1

Published Online: 2014-11-13

Published Print: 2015-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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